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Semiconductor Engineering5 October 2026

Reducing Contact Resistance Pushes 2D Transistors Toward Advanced CMOS (HUST, PolyU, UCSB, NUS)

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Semiconductor Engineering

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Executive Briefing & Key Highlights

Researchers at Huazhong University of Science and Technology, Hong Kong Polytechnic University, University of California, Santa Barbara, and National University of Singapore published a technical paper titled “Low contact resistance and high current density in ballistic p-type transistors based on oxygen-doped WSe2 monolayers.” Abstract Excerpt: “The development of high-performance p-type monolaye

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