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Reducing Contact Resistance Pushes 2D Transistors Toward Advanced CMOS (HUST, PolyU, UCSB, NUS)
BerojgarDegreeWala Editorial5 October 2026
Semiconductor Engineering5 October 2026
Reducing Contact Resistance Pushes 2D Transistors Toward Advanced CMOS (HUST, PolyU, UCSB, NUS)
Original Publication
Semiconductor Engineering
Executive Briefing & Key Highlights
Researchers at Huazhong University of Science and Technology, Hong Kong Polytechnic University, University of California, Santa Barbara, and National University of Singapore published a technical paper titled “Low contact resistance and high current density in ballistic p-type transistors based on oxygen-doped WSe2 monolayers.” Abstract Excerpt: “The development of high-performance p-type monolaye
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