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ASML EUV Lithography Systems R&D Specialist
ASML→FellowshipOfficial Link Verified30 days left (15 Oct 2026)
Apply by 15 Oct 2026
Description
R&D engineering for High-NA Twinscan EUV systems. Sub-nanometer mirror positioning, laser-produced plasma (LPP) light sources, and wafer stage control dynamics.
Eligibility
- M.Sc / PhD in Physics / Optical Engineering / Mechatronics.
Quick Facts
Position Type
Fellowship
Organization Type
Research
Work Location
Veldhoven, Netherlands
Compensation / Stipend
€65,000 - €95,000/year
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Quick Facts
Location
Veldhoven, Netherlands
Type
Fellowship
Deadline
15 Oct 2026
Stipend
€65,000 - €95,000/year
Org. Type
Research
AI Analysis & Insights
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