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Semiconductor Engineering12 August 2026

Defect Prediction in Optical Lithography, EUVL, and NIL (National Taiwan University)

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Executive Briefing & Key Highlights

National Taiwan University researchers published a technical paper titled “From Lithography to Nanoimprint: Physics-Based, Data-Driven, and Hybrid Frameworks for Defect Prediction in Advanced Patterning Technologies.” Abstract: “Advanced patterning technologies have evolved from direct optical image transfer into predictive manufacturing frameworks in which defects are shaped by imaging physics, m

Topics:semiconductorchip designEDAAdvanced PackagingNanotechnology