Semiconductor Engineering#semiconductor
Defect Prediction in Optical Lithography, EUVL, and NIL (National Taiwan University)
BerojgarDegreeWala Editorial12 August 2026
Semiconductor Engineering12 August 2026
Defect Prediction in Optical Lithography, EUVL, and NIL (National Taiwan University)
Original Publication
Semiconductor Engineering
Executive Briefing & Key Highlights
National Taiwan University researchers published a technical paper titled “From Lithography to Nanoimprint: Physics-Based, Data-Driven, and Hybrid Frameworks for Defect Prediction in Advanced Patterning Technologies.” Abstract: “Advanced patterning technologies have evolved from direct optical image transfer into predictive manufacturing frameworks in which defects are shaped by imaging physics, m
Topics:semiconductorchip designEDAAdvanced PackagingNanotechnology
